Narrow-channel transistor threshold self-adjustment technique for ULSI with LOCOS isolation
- Author(s):
Loiko,K.V. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) ) Peidous,I.V. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) ) Ho,H.-M. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) ) Bromley-Barratt,J.F. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) ) Quek,E.K.B. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) ) Lim,D.H.Y. - Publication title:
- Microelectronic Device Technology : 1-2 October 1997, Austin, Texas
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3212
- Pub. Year:
- 1997
- Page(from):
- 383
- Page(to):
- 385
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819426444 [081942644X]
- Language:
- English
- Call no.:
- P63600/3212
- Type:
- Conference Proceedings
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