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Characterization of polymer formation during Si02 etching with different fluorocarbon gases (CHF3,CF4,C4F8)

Author(s):
Loong,S.Y. ( National University of Singapore )
Lee,H.K. ( National University of Singapore )
Chan,L.H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Zhou,M.S. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Loh,F.C. ( National University of Singapore )
Tan,K.L. ( National University of Singapore )
1 more
Publication title:
Microelectronic Device Technology : 1-2 October 1997, Austin, Texas
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3212
Pub. Year:
1997
Page(from):
376
Page(to):
382
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426444 [081942644X]
Language:
English
Call no.:
P63600/3212
Type:
Conference Proceedings

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