Advantages of SOI technology in low-voltage ULSIs (Invited Paper)

Advantages of SOI technology in low-voltage ULSIs (Invited Paper)

Author(s):

Yoshimi,M. ( Toshiba Corp. (Japan) )

Kawanaka,S. ( Toshiba Corp. (Japan) )

Yamada,T. ( Toshiba Corp. (Japan) )

Terauchi,M. ( Toshiba Corp. (Japan) )

Shino,T. ( Toshiba Corp. (Japan) )

Fuse,T. ( Toshiba Corp. (Japan) )

Oowaki,Y. ( Toshiba Corp. (Japan) )

Watanabe,S. ( Toshiba Corp. (Japan) )

3 more

Publication title:

Microelectronic Device Technology : 1-2 October 1997, Austin, Texas

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3212

Pub. Year:

1997

Page(from):

178

Page(to):

187

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426444 [081942644X]

Language:

English

Call no.:

P63600/3212

Type:

Conference Proceedings

Details

TDL ID:	ZA00018328
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Microelectronic Device Technology
Conf. info. (Number):	1997
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	1997.10.01-1997.10.02

Similar Items:

1 Conference Proceedings Functional components in SOI photonic crystal slabs (Invited Paper) Shinya, A., Notomi, M., Kuramochi, E., Shoji, T., Watanabe, T., Tsuchizawa, T., Yamada, K., Morita, H. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Reduction of the floating body effects in SOI MOSFETs by Ge ion implantation into source/drain Yoshimi, M, Nishiyama, A, Arisumi, O, Terauchi, M, Matsuzawa, K, Shigyo, N Electrochemical Society
2 Conference Proceedings SOI-based photonic crystal line-defect waveguides (Invited Paper) Yamada, K., Notomi, M., Shinya, A., Yokohama, I., Shoji, T., Tsuchizawa, T., Watanabe, T., Takahashi, J., Tamechika, E., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Damage Free, Low Via Resistance Sputter Cleaning Technology for ULSI Devices Y. Tanaka, M. Taoka, H. suzuki, F. Yanagawa, B. Cohen, H. Hanawa, T. Taniguchi, M. Togashi, K. Watanabe Electrochemical Society
3 Conference Proceedings Current Status and Future Direction of SOI Technology Yoshimi, M. Electrochemical Society	9 Conference Proceedings Intrinsic Advantages of SOI Multiple-Gate MOSFET (MuGFET) for Low Power Applications W. W. Xiong, C. Cleavelin, C. Hsu, M. Ma, K. Schruefer, K. Von Arnim, T. Schulz, I. Cayrefourcq, C. Mazure, P. Patruno, … Electrochemical Society
4 Conference Proceedings Study of Self-Heating Effect on Device Performance of Sub-0.1um SOI MOSFETs Including Velocity Overshoot Kawanaka, S., Matsuzawa, K., Inoh, K., Katsumata, Y., Yoshimi, M., Ishiuchi, H. Electrochemical Society	10 Conference Proceedings Ultrasmall resonant tunneling/dropping devices in 2D photonic crystal slabs (Invited Paper) Shinya, A., Mitsugi, S., Kuramochi, E., Tanabe, T., Kim, G., Kira, G., Kondo, S., Yamada, K., Watanabe, T., Tsuchizawa, … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Novel fiber amplifier technology (Invited Paper) Yamada, M., Aozasa, S., Ono, H., Mori, A., Sakamoto, T., Shikano, K., Shimizu, M. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Fabrication and characterization of waveguide structures on SOI (Invited Paper) Aalto, T.T., Heimala, P., Yliniemi, S., Kapulainen, M., Leppihalme, M.J. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Low frequency noise in SOI transistors (Invited Paper) Tseng, T., Woo, J. C. S. SPIE - The International Society of Optical Engineering	12 Conference Proceedings The benefit of SOI technologies for low-voltage RFID applications Viliard, P., Jomaah, J., Gomez, B., De Pontcharra, J., Save, D., Chouteau, S., Mackowiak, E. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12