Blank Cover Image

Potential of rf Si-MOS LSI technology (Invited Paper)

Author(s):
Matsuzawa,A. ( Matsushita Electric Industrial Co.,Ltd. (Japan) )  
Publication title:
Microelectronic Device Technology : 1-2 October 1997, Austin, Texas
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3212
Pub. date:
1997
Page(from):
88
Page(to):
96
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426444 [081942644X]
Language:
English
Call no.:
P63600/3212
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings MOS Technologies and Devices for LSI

Hoefflinger B.

Martinus Nijhoff Publishers

Hong, S., Kim, Y., Min, H.S., Park, Y.J.

SPIE-The International Society for Optical Engineering

Kawate,K., Takigawa,T., Ishiuchi,H., Goto,M.

SPIE - The International Society for Optical Engineering

Mercha, A., Simoen, E., Decoutere, S., Claeys, C.

SPIE - The International Society of Optical Engineering

Sato,Y., Kosugi,T., shii,H.

SPIE-The International Society for Optical Engineering

Lin, C. -H., Liu, C. W.

SPIE - The International Society of Optical Engineering

Shishiguchi,S., Yasunaga,T., Aoyama,T., Tatsumi,T., Saito,S.

SPIE-The International Society for Optical Engineering

Matsuzawa, A.

Electrochemical Society

Hack, M., Weaver, M. S., Adamovich, V., Kwong, R. C., Lu, M. H., Brown, J. J.

SPIE - The International Society of Optical Engineering

11 Conference Proceedings JOSEPHSON LSI TECHNOLOGY AND CIRCUITS

Hayakawa Hisao

Springer-Verlag

Douseki, T, Yamada, I

Electrochemical Society

Storey, J. W. V.

SPIE - The International Society of Optical Engineering

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12