Optimization of pre-gate clean technology for a 0.35-ｦﾌm dual-oxide/dual-voltage CMOS process

Author(s):

Brugge,H.B. ( VLSI Technology,Inc. )

Karnett,M.P. ( VLSI Technology,Inc. )

de Muizon,E. ( VLSI Technology,Inc. )

Zhou,J. ( VLSI Technology,Inc. )

Page,A. ( VLSI Technology,Inc. )

Vines,L.B. ( VLSI Technology,Inc. )

Haby,B.J. ( VLSI Technology,Inc. )

2 more

Publication title:

Microelectronic Device Technology : 1-2 October 1997, Austin, Texas

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3212

Pub. Year:

1997

Page(from):

52

Page(to):

60

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426444 [081942644X]

Language:

English

Call no.:

P63600/3212

Type:

Conference Proceedings