Acid diffusion in a chemically amplified negative i-line photoresist
- Author(s):
Connolly,J. ( IBM Microelectronics Div. ) Chen,K.R. ( IBM Microelectronics Div. ) Kwong,R.W. ( IBM Microelectronics Div. ) Lawson,M. ( IBM Microelectronics Div. ) Linehan,L.L. ( Shipley Co. Inc. ) Moreau,W.M. ( IBM Microelectronics Div. ) - Publication title:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3333
- Pub. Year:
- 1998
- Vol.:
- Part 2
- Page(from):
- 1124
- Page(to):
- 1131
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- Language:
- English
- Call no.:
- P63600/3333
- Type:
- Conference Proceedings
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