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Acid diffusion in a chemically amplified negative i-line photoresist

Author(s):
Connolly,J. ( IBM Microelectronics Div. )
Chen,K.R. ( IBM Microelectronics Div. )
Kwong,R.W. ( IBM Microelectronics Div. )
Lawson,M. ( IBM Microelectronics Div. )
Linehan,L.L. ( Shipley Co. Inc. )
Moreau,W.M. ( IBM Microelectronics Div. )
1 more
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 2
Page(from):
1124
Page(to):
1131
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

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