Effect of resin molecular weight on novolak dissolution

Author(s):

• Shih,H.-Y. ( Polytechnic Univ. )
• Zhuang,H. ( Polytechnic Univ. )
• Reiser,A. ( Polytechnic Univ. )
• Gallagher-Wetmore,P.M. ( Phasex Corp. )

Publication title:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3333

Pub. Year:

1998

Vol.:

Part 2

Page(from):

1052

Page(to):

1060

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

Language:

English

Call no.:

P63600/3333

Type:

Conference Proceedings