Enhancement of process latitude by reducing resist thickness for KrF excimer laser lithography

Enhancement of process latitude by reducing resist thickness for KrF excimer laser lithography

Author(s):

Asano,M. ( Toshiba Corp. (Japan) )

Maruyama,Y. ( Toshiba Corp. (Japan) )

Koike,T. ( Toshiba Corp. (Japan) )

Chiba,K. ( Toshiba Corp. (Japan) )

Shiobara,E. ( Toshiba Corp. (Japan) )

Ikeda,T. ( Toshiba Corp. (Japan) )

1 more

Publication title:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3333

Pub. Year:

1998

Vol.:

Part 2

Page(from):

869

Page(to):

879

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

Language:

English

Call no.:

P63600/3333

Type:

Conference Proceedings

Details

TDL ID:	ZA00018317
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	1998 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

Similar Items:

1 Conference Proceedings Resist edge roughness with reduced pattern size Shiobara,E., Kawamura,D., Matsunaga,K., Koike,T., Mimotogi,S., Azuma,T., Onishi,Y. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Inline CO metrology with combined use of scatterometry and CO-SEM [6152-69] Asano, M., Ikeda, T., Koike, T., Abe, H. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Quarter-and subquarter-micron deep-UV lithography with chemically amplified positive resist Onishi,Y., Sato,K., Chiba,K., Asano,M., Niki,H., Hayase,R.H., Hayashi,T. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Material and process development of trilevel resist system in KrF lithography Shibata, T., Nakagawa, S., Sato, Y., Sho, K., Hayashi, H., Abe, J. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Extremely Enhanced Diffusion of Nitrogen in 4H-SiC Observed in Liquid-Nitrogen Immersion Irradiation of Excimer Laser A. Ikeda, D. Marui, H. Ikenoue, T. Asano Trans Tech Publications	9 Conference Proceedings n- and p-Type Doping of 4H-SiC by Wet-Chemical Laser Processing K. Nishi, A. Ikeda, D. Marui, H. Ikenoue, T. Asano Trans Tech Publications
4 Conference Proceedings Excimer laser processing for integrated gamma-ray detectors Nakamura, A., Niraula, M., Asano, K., Aoki, T., Hatanaka, Y. SPIE-The International Society for Optical Engineering	10 Conference Proceedings The sidewall angle dependence of CDSEM measurements and its impact on CD process control Koike, T., Asano, M., Mikami, T., Yamazaki, Y. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Dependence of ArF resist on exposed area ratio Shiobara, E., Chiba, K., Hayasaki, K., Kawamura, D. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Negative-type chemically amplified resists for ArF excimer laser lithography Naito,T., Takahashi,M., Ohfuji,T., Sasago,M. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Enhanced Grain-Boundary Sliding at Room Temperature in AZ31 Magnesium Alloy Ohyama, R., Koike, J., Kobayashi, T., Suzuki, M., Maruyama, K. Trans Tech Publications	12 Conference Proceedings *RECENT PROGRESS IN EXCIMER LASER LITHOGRAPHY Higashikawa, I., Nonaka, M., Sato, T., Nakase, M., Ito, S., Horioka, K., Horrike Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12