New dry-developable chemically amplified photoresist

New dry-developable chemically amplified photoresist

Author(s):

Kim,J.-B. ( Korea Advanced Institute of Science and Technology )
Kim,H. ( Korea Advanced Institute of Science and Technology )

Publication title:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3333

Pub. Year:

1998

Vol.:

Part 1

Page(from):

786

Page(to):

793

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

Language:

English

Call no.:

P63600/3333

Type:

Conference Proceedings

Details

TDL ID:	ZA00018317
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	1998 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

Similar Items:

1 Conference Proceedings Acid mobility in chemically amplified photoresists Stewart, M.D., Becker, D.J., Stachowiak, T.B., Schmid, G.M., Michaelson, T.B., Tran, H.V., Willson, C.G. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Non-chemically amplified 193-nm top surface imaging photoresist development: polymer substituent and polydispersity effects Kim, M. -S., Kim, H. -G., Kim, H. -S., Baik, K. -H., Johnson, D. W., Cernigliaro, G. J., Minsek, D. W. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Influence of activation energy on LER in chemically amplified KrF photoresists Kim, J.H., Lee, C.H., Park, S.B., Kim, W.M., Moon, S.S., Kim, K.-M., Lee, S.Y., Yoon, S., Kim, Y.H., Chon, S.-M. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Contamination control for processing DUV chemically amplified photoresists J.C. Vigil, M.W. Barrick, T.H. Grafe Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Explanation of LER using the concept of gel layer in chemically amplified photoresists Cho, J.Y., Choi, S.J., Choi, Y.J., Kim, H.L., Kim, K.H. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Characterization of a positive chemically amplified photoresist for process control Jakatdar,N.H., Niu,X., Spanos,C.J., Romano,A.R., Bendik,J.J., Kovacs,R.P., Hill,S.L. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Novel hardening methods of DUV chemically amplified photoresist by ion implantation and its application to new organic ARC material and bilayer process Chun, J. -S., Kim, H. -E., Barnett, S., Shih, I. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Acid diffusion and evaporation in chemically amplified resists Kim, J. -B., Kwon, Y. -G., Choi, J. -H., Jung, M. -H. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes)containing acetal groups Park,J.-H., Kim,S.-J., Kim,J.-H., Seo,D.-C., Kim,K.-D., Park,S.-Y., Lee,H. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Design and properties of new deep-UV positive photoresist Choi,S.-J., Jung,S.-Y., Kim,C.-H., Park,C.-G., Han,W.-S., Koh,Y.-B., Lee,M.-Y. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Novel surface silylation process for chemically amplified photoresist Lee, S.-H., Hong, J., Woo, S.-G., Cho, H.-G., Han, W,-S. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Chemically amplified resists based on the norbornene copolymers with steroid derivatives Kim, J. -B., Lee, B. -W., Kang, J. -S., Kim, S. -J., Park, J. -H., Seo, D. -C., Balk, K. -H., Jung, J. -C., Roh, C. -H. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12