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Advanced negative resists using novel aminoplast crosslinkers

Author(s):
Afzali,A. ( IBM Thomas J. Watson Research Ctr. )
Gelorme,J.D. ( IBM Thomas J. Watson Research Ctr. )
Kosbar,L.L. ( IBM Thomas J. Watson Research Ctr. )
Neisser,M.O. ( IBM Microelectronics Div. )
Brunswold,W. ( IBM Microelectronics Div. )
Feild,C. ( IBM Microelectronics Div. )
Lawson,M. ( IBM Microelectronics Div. )
Varanasi,R. ( IBM Microelectronics Div. )
3 more
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 1
Page(from):
758
Page(to):
767
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

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