Line-edge roughness in sub-0.18-ヲフm resist patterns
- Author(s):
Palmateer,S.C. ( MIT Lincoln Lab. ) Cann,S.G. ( MIT Lincoln Lab. ) Curtin,J.E. ( MIT Lincoln Lab. ) Doran,S.P. ( MIT Lincoln Lab. ) Eriksen,L.M. ( MIT Lincoln Lab. ) Forte,A.R. ( MIT Lincoln Lab. ) Kunz,R.R. ( MIT Lincoln Lab. ) Lyszczarz,T.M. ( MIT Lincoln Lab. ) Stern,M.B. ( MIT Lincoln Lab. ) Nelson,C.M. ( Motorola and SEMATECH ) - Publication title:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3333
- Pub. Year:
- 1998
- Vol.:
- Part 1
- Page(from):
- 634
- Page(to):
- 642
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- Language:
- English
- Call no.:
- P63600/3333
- Type:
- Conference Proceedings
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