Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm

Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm

Author(s):

Opitz,J. ( IBM Almaden Research Ctr. )
Allen,R.D. ( IBM Almaden Research Ctr. )
Wallow,T.I. ( IBM Almaden Research Ctr. )
Wallraff,G.M. ( IBM Almaden Research Ctr. )
Hofer,D.C. ( IBM Almaden Research Ctr. )

Publication title:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3333

Pub. Year:

1998

Vol.:

Part 1

Page(from):

571

Page(to):

578

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

Language:

English

Call no.:

P63600/3333

Type:

Conference Proceedings

Details

TDL ID:	ZA00018317
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	1998 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

Similar Items:

1 Conference Proceedings Positive bilayer resists for 248-and 193-nm lithography Sooriyakumaran,R., Wallraff,G.M., Larson,C.E., Fenzel-Alexander,D., DiPietro,R.A., Opitz,J., Hofer,D.C., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings New approaches to production-worthy 193-nm photoresists based on acrylic copolymers Wallow,T.I., Allen,R.D., Opitz,J., Dipietro,R.A., Brock,P.J., Sooriyakumaran,R., Hofer,D.C. SPIE-The International Society for Optical Engineering
2 Conference Proceedings 193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system R.D. Allen, G.M. Wallraff, R.A. DiPietro, D.C. Hofer, R.R. Kunz Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings Molecular weight tailoring in methacrylate 193-nm photoresists Wallow, T. I., Brock, P. J., Truong, H., Allen, R. D., Opitz, J., Hofer, D. C. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Protecting groups for 193-nm photoresists Allen,R.D., Sooriyakumaran,R., Opitz,J., Wallraff,G.M., DiPietro,R.A., Breyta,G., Hofer,D.C., Kunz,R.R., Jayaraman,S., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins) Varanasi, P. R., Maniscalco, J., Mewherter, A. M., Lawson, M. C., Jordhamo, G., Allen, R. D., Opitz, J., Ito, H., … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Limits to etch resistance for 193-nm single-layer resists Kunz,R.R., Palmateer,S.C., Forte,A.R., Allen,R.D., Wallraff,G.M., DiPietro,R.A., Hofer,D.C. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Extension of 248-nm optical lithography: a thin film imaging approach Lin,Q., Katnani,A.D., Brunner,T.A., DeWan,C., Fairchok,C., LaTulipe,D.C.,Jr., Simons,J.P., Petrillo,K.E., Babich,K., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Role of photoacid structure on the performance of 193-nm resists Allen,R.D., Opitz,J., Larson,C.E., DiPietro,R.A., Breyta,G., Hofer,D.C. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes) Varanasi,P.R., Jordhamo,G.M., Lawson,M.C., Chen,K.-J., Brunsvold,W.R., Hughes,T., Keller,R., Khojasteh,M., Li,W., … SPIE - The International Society for Optical Engineering
6 Conference Proceedings Reactive ion etching of 193-nm resist candidates: current platforms and future requirements Wallow,T.I., Brock,P.J., DiPietro,R.A., Allen,R.D., Opitz,J., Sooriyakumaran,R., Hofer,D.C., Meute,J., Byers,J.D., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings "IBM 193-nm bilayer resist: materials, lithographic performance, and optimization" Kwong,R.W., Varanasi,P.R., Lawson,M.C., Hughes,T., Jordhamo,G.M., Khojasteh,M., Mahorowala,A.P., Sooriyakumaran,R., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12