Application of plasma-polymerized methylsilane for 0.18-ｦﾌm photolithography

Application of plasma-polymerized methylsilane for 0.18-ｦﾌm photolithography

Author(s):

Monget,C. ( France Telecom-CNET )

Lee,C.Y. ( Intel Corp. )

Joubert,O.P. ( France Telecom-CNET and CNRS-LPCM-IMN (France) )

Amblard,G.R. ( CNET/SGS-Thomson (France) )

Weidman,T.W. ( Applied Materials )

Sugiarto,D. ( Applied Materials )

Yang,J. ( Intel Corp. )

Cormont,F. ( France Telecom-CNET )

Inglebert,R.L. ( Univ.d'Orleans (France) )

4 more

Publication title:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3333

Pub. Year:

1998

Vol.:

Part 1

Page(from):

366

Page(to):

375

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

Language:

English

Call no.:

P63600/3333

Type:

Conference Proceedings

Details

TDL ID:	ZA00018317
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	1998 : 15th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1998.02.23-1998.02.25

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