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Novel antireflective structure for metal layer patterning

Author(s):
Choi,S.-S. ( Electronics and Telecommunications Research Institute (Korea) )
Cha,H.S. ( Hanyang Univ.(Korea) )
Kim,J.-S. ( Electronics and Telecommunications Research Institute (Korea) )
Park,J.M. ( Electronics and Telecommunications Research Institute (Korea) )
Kim,D.H. ( Electronics and Telecommunications Research Institute (Korea) )
Lee,K.H. ( Electronics and Telecommunications Research Institute (Korea) )
Ahn,J. ( Hanyang Univ.(Korea) )
Chung,H.B. ( Electronics and Telecommunications Research Institute (Korea) )
Kim,B.W. ( Electronics and Telecommunications Research Institute (Korea) )
4 more
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 1
Page(from):
336
Page(to):
346
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

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