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Extension of 248-nm optical lithography: a thin film imaging approach

Author(s):
Lin,Q. ( IBM Semiconductor Research and Development Ctr. )
Katnani,A.D. ( IBM Semiconductor Research and Development Ctr. )
Brunner,T.A. ( IBM Semiconductor Research and Development Ctr. )
DeWan,C. ( IBM Semiconductor Research and Development Ctr. )
Fairchok,C. ( IBM Semiconductor Research and Development Ctr. )
LaTulipe,D.C.,Jr. ( IBM Thomas J. Watson Research Ctr. )
Simons,J.P. ( IBM Thomas J. Watson Research Ctr. )
Petrillo,K.E. ( IBM Thomas J. Watson Research Ctr. )
Babich,K. ( IBM Thomas J. Watson Research Ctr. )
Seeger,D.E. ( IBM Thomas J. Watson Research Ctr. )
Angelopoulos,M. ( IBM Thomas J. Watson Research Ctr. )
Soonyakumaran,R. ( IBM Almaden Research ctr. )
Wallraff,G.M. ( IBM Almaden Research ctr. )
Hofer,D.C. ( IBM Almaden Research ctr. )
9 more
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 1
Page(from):
278
Page(to):
288
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

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