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Positive- and negative-tone water-processable photoresists: a progress report

Author(s):
Yamada,S. ( Univ.of Texas at Austin )
Medeiros,D.R. ( Univ.of Texas at Austin )
Patterson,K. ( Univ.of Texas at Austin )
Jen,W.-L.K. ( Univ.of Texas at Austin )
Rager,T. ( Univ.of Texas at Austin )
Lin,Q. ( Univ.of Texas at Austin )
Lenci,C. ( Univ.of Texas at Austin )
Byers,J.D. ( SEMATECH )
Havard,J.M. ( Univ.of California/Berkeley )
Pasini,D. ( Univ.of California/Berkeley )
Frechet,J.M.J. ( Univ.of California/Berkeley )
Willson,C.G. ( Univ.of Texas at Austin )
7 more
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 1
Page(from):
245
Page(to):
253
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

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