Positive bilayer resists for 248-and 193-nm lithography
- Author(s):
Sooriyakumaran,R. ( IBM Almaden Research Ctr. ) Wallraff,G.M. ( IBM Almaden Research Ctr. ) Larson,C.E. ( IBM Almaden Research Ctr. ) Fenzel-Alexander,D. ( IBM Almaden Research Ctr. ) DiPietro,R.A. ( IBM Almaden Research Ctr. ) Opitz,J. ( IBM Almaden Research Ctr. ) Hofer,D.C. ( IBM Almaden Research Ctr. ) LaTulipe,D.C.,Jr. ( IBM Thomas J. Watson Research Ctr. ) Simons,J.P. ( IBM Thomas J. Watson Research Ctr. ) Petrillo,K.E. ( IBM Thomas J. Watson Research Ctr. ) Babich,K. ( IBM Thomas J. Watson Research Ctr. ) Angelopoulos,M. ( IBM Thomas J. Watson Research Ctr. ) Lin,Q. ( IBM Microelectronics Div. ) Katnani,A.D. ( IBM Microelectronics Div. ) - Publication title:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3333
- Pub. Year:
- 1998
- Vol.:
- Part 1
- Page(from):
- 219
- Page(to):
- 227
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- Language:
- English
- Call no.:
- P63600/3333
- Type:
- Conference Proceedings
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