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Design of cycloolefin-maleic-anhydride resist for ArF lithography

Author(s):
  • Jung,J.-C. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
  • Bok,C.-K. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
  • Baik,K.-H. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
Publication title:
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3333
Pub. Year:
1998
Vol.:
Part 1
Page(from):
11
Page(to):
25
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427786 [0819427780]
Language:
English
Call no.:
P63600/3333
Type:
Conference Proceedings

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