Design of cycloolefin-maleic-anhydride resist for ArF lithography
- Author(s):
- Jung,J.-C. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
- Bok,C.-K. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
- Baik,K.-H. ( Hyundai Electronics Industries Co.,Ltd. (Korea) )
- Publication title:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3333
- Pub. Year:
- 1998
- Vol.:
- Part 1
- Page(from):
- 11
- Page(to):
- 25
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- Language:
- English
- Call no.:
- P63600/3333
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
ArF photoresist system: using cycloolefin-alt-maleic anhydride pericyclic acrylate terpolymers
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Dissolution properties of cycloolefin-maleic-anhydride-based resist resins
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Comparison study for sub-0.13-ヲフm lithography between ArF and KrF lithography
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
CD metrology for avoiding shrinkage of ArF resist patterns in 100-nm ArF lithography
SPIE-The International Society for Optical Engineering |