Two-step ablation for CVD SiO2 film by ArF excimer laser
- Author(s):
- Seki,Y. ( NEC Corp. (Japan) )
- Publication title:
- High-Power Laser Ablation
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3343
- Pub. Year:
- 1998
- Vol.:
- Part 2
- Page(from):
- 998
- Page(to):
- 1009
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427908 [081942790X]
- Language:
- English
- Call no.:
- P63600/3343
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
9
Conference Proceedings
ArF Excimer Laser and Xe2 Excimer Lamp Induced Photochemical Fluorination of Polyimide Film
MRS - Materials Research Society |
4
Conference Proceedings
Non-Equilibrium Two-Dimensional Model of Excimer-Laser Melting and Solidification of Thin Si Films on SiO2
MRS - Materials Research Society |
10
Conference Proceedings
Sub-0.1-µm ArF excimer laser lithography with alternating phase-shifting masks
Society of Photo-optical Instrumentation Engineers |
5
Conference Proceedings
Transparent Conducting ZnO:Al Thin Films Prepared by ArF Excimer Laser Ablation
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
6
Conference Proceedings
COMPARISON OF THE PROCESSES INDUCED BY MERCURY LAMP AND ArF EXCIMER LASER PHOTOASSISTED CVD OF a-Si: H FILMS
Materials Research Society |
12
Conference Proceedings
Influence of the ablation plume on the removal process during ArF-excimer laser photoablation
SPIE-The International Society for Optical Engineering |