Engineering Optimization of Polyglutarimide for Photoresist Applications

Engineering Optimization of Polyglutarimide for Photoresist Applications

Author(s):: Holloway D. M. ( University of Massachusetts-Lowell )
Publication title:: ANTEC 93 : Be in that number : conference proceedings : New Orleans, May 9-13, 1993
Title of ser.:: Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
Ser. no.:: 39
Pub. Year:: 1993
Vol.:: 1
Page(from):: 1657
Page(to):: 1659
Pages:: 3
Pub. info.:: Brookfield Center, CT: Society of Plastics Engineers, Inc. (SPE)
Language:: English
Call no.:: S42700/932082
Type:: Conference Proceedings

Details

TDL ID:	ZA00018300
Series ID:	PA00000030
Conf. info. (Name):	ANTEC '93 : Annual Technical Conference
Conf. info. (Number):	51st
Conf. info. (Venue):	New Orleans, LA, USA
Conf. info. (Date):	1993.05.09-1993.05.13
Note for article:	ELECTRICAL & ELECTRONIC DIVISION

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