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Using the surface charge profiler for in-tine monitoring of doping concentration in silicon epitaxial wafer manufacturing

Author(s):
Publication title:
In-Line Methods and Monitors for Process and Yield Improvement
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3884
Pub. date:
1999
Page(from):
174
Page(to):
181
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434814 [0819434817]
Language:
English
Call no.:
P63600/3884
Type:
Conference Proceedings

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