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Practical manufacturing technique for reducing charge-induced gate oxide degradation during ion implantation

Author(s):
Moerschel,K.G. ( Lucent Technologies/Bell Labs. )
Possanza,W.A.
Sung,J.
Prozonic,M.A.
Long,T.
Pavlo,J.
Chrapacz,T.
2 more
Publication title:
In-Line Methods and Monitors for Process and Yield Improvement
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3884
Pub. Year:
1999
Page(from):
65
Page(to):
76
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434814 [0819434817]
Language:
English
Call no.:
P63600/3884
Type:
Conference Proceedings

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