Integrated yield and CD enhancement for advanced DUV Lithography

Integrated yield and CD enhancement for advanced DUV Lithography

Author(s):

Krishna,M.S. ( Silicon Valley Group Inc. )

Publication title:

In-Line Methods and Monitors for Process and Yield Improvement

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3884

Pub. Year:

1999

Page(from):

56

Page(to):

64

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819434814 [0819434817]

Language:

English

Call no.:

P63600/3884

Type:

Conference Proceedings

Details

TDL ID:	ZA00018101
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : In-Line Methods and Monitors for Process and Yield Improvement
Conf. info. (Number):	1999
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.09.22-1999.09.23

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