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Effects of metal impuritites on the etch rate selectivity of(110)/(111)in(11O)Si anisotropic etching

Author(s):
Hirata,Y. ( Mitsubishi Electric Corp. )
Tsugai,M.
Tanimoto,K.
Usami,T.
Yamaguchi,Y.
Otani,H.
Nakamura,K.
2 more
Publication title:
Micromachining and microfabrication process technology V : 20-22 September, 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3874
Pub. Year:
1999
Page(from):
276
Page(to):
283
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434715 [081943471X]
Language:
English
Call no.:
P63600/3874
Type:
Conference Proceedings

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