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Deep anisotropic ICP plasma etching designed for high-volume MEMS manufacturing

Author(s):
Publication title:
Micromachining and microfabrication process technology V : 20-22 September, 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3874
Pub. Year:
1999
Page(from):
218
Page(to):
226
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434715 [081943471X]
Language:
English
Call no.:
P63600/3874
Type:
Conference Proceedings

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