193-nm lithography:new challenges,new worries

193-nm lithography:new challenges,new worries

Author(s):

McCallum,M. ( SEMATECH(USA)and Motorola )
Domke,W.-D.
Byers,J.D.
Stark,D.R.

Publication title:

Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3741

Pub. Year:

1999

Page(from):

59

Page(to):

65

Pub. info.:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819432216 [0819432210]

Language:

English

Call no.:

P63600/3741

Type:

Conference Proceedings

Details

TDL ID:	ZA00018088
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing Technologies : Lithography for Semiconductor Manufacturing
Conf. info. (Number):	1999
Conf. info. (Venue):	Edinburgh, Scotland
Conf. info. (Date):	1999.05.19-1999.05.21

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