Blank Cover Image

Alignment performance as a function of chemical mechanical polishing techniques and stepper optimization

Author(s):
Publication title:
Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3741
Pub. Year:
1999
Page(from):
10
Page(to):
22
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819432216 [0819432210]
Language:
English
Call no.:
P63600/3741
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Defect detection strategies for chemical-mechanical polishing process in shallow-trench isolation applications

Li,J.J., Liu,A.H., Hiemke,S.S.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Modeling of Polishing Regimes in Chemical Mechanical Polishing

Yeruva, Suresh B., Park, Chang-Won, Moudgil, Brij M.

Materials Research Society
2 Conference Proceedings Investigation of the Role of Chemical-Mechanical Polishing in Improving the Performance of Polysilicon TFTs

Armstrong, B. M., Baine, P. T., Gamble, H. S., Lee, B., Mitchell, S. J. N., Quinn, L. J.

Materials Research Society
8 Conference Proceedings Study on chemical mechanical polishing process of lithium niobate

S. Wang, Y. Liu, Z. Li

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Modeling Dielectric Erosion in Multi-Step Copper Chemical-Mechanical Polishing

Noh, K., Saka, N., Chun, J.-H.

Electrochemical Society
9 Conference Proceedings High-Quality Germanium Photodiodes on Silicon Substrates Using an Intermediate Chemical Mechanical Polishing Step

Samavedam, Srikanth B., Currie, Matthew T., Langdo, Thomas A., Ting, Steve M., Fitzgerald, Eugene A.

MRS - Materials Research Society
4 Conference Proceedings Novel U-groove channel for self-alignment of optical fibers with optical quality end-polished silicon rib waveguides using wet chemical micromachining …

Ngo,N.Q., Rosa,M.A., Sweatman,D.R., Dimitrijev,S., Harrison,H.B., Titmarsh,A.

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Removal Rate, Uniformity and Defectivity Studies Of Chemical Mechanical Polishing of BPSG Films

Bonner, B.A., Fishkin, B., David, J., Garretson, C., Osterheld, T.H.

Materials Research Society
5 Conference Proceedings The Important Role of Oxidant in Copper Interconnection Chemical Mechanical Polishing for GLSI

X.Y. Liu, Y.L. Liu, X.H. Niu, Z.W. Zhao, Y. Hu

Trans Tech Publications
11 Conference Proceedings Optimization of a Chemical Mechanical Polishing Process for Dielectric Planarization

Weling, M., Drill, C.

Electrochemical Society
6 Conference Proceedings The Copper Corrosion and Sulfur Contamination Generated by a Three-Step Copper Chemical-Mechanical Polishing Process

Liu, Chun-Ping, Ho, Yen=Shih, Hu, Tien-Chen, Tseng, Bae-Heng

Materials Research Society
12 Conference Proceedings Effect of Abrasive Particles on Chemical Mechanical Polishing Performance

Tamboli, D., Banerjee, G., Chang, S., Waddell, M., Butcher, I., Arefeen, Q., Hymes, S.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12