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Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithograph

Author(s):
Watanabe,T. ( Himeji Institute of Technology )
Kinoshita,H.
Miyafuji,A.
Irie,S.
Shirayone,S.
Mori,S.
Yano,E.
Hada,H.
Ohmori,K.
Komano,H.
5 more
Publication title:
Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3997
Pub. Year:
2000
Page(from):
600
Page(to):
607
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436153 [0819436151]
Language:
English
Call no.:
P63600/3997
Type:
Conference Proceedings

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