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Extreme ultraviolet lithography:reflective mask technology

Author(s):
Walton,C.C. ( Lawrence Livermore National Lab. )
Kearney,P.A.
Mirkarimi,P.B.
Bowers,J.M.
Cerjan,C.J.
Warrick,A.L.
Wilhelmsen,K.C.
Fought,E.R.
Moore,C.E.
Larson,C.
Baker,S.L.
Burkhart,S.C.
Hector,S.D.
8 more
Publication title:
Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3997
Pub. Year:
2000
Page(from):
496
Page(to):
507
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436153 [0819436151]
Language:
English
Call no.:
P63600/3997
Type:
Conference Proceedings

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