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Resist technologies for ion projection lithography(IPL)stencil maskmaking

Author(s):
Irmscher,M. ( lnstitut fur Mikroelektronik Chips )
Butschke,J.
Elian,K.
Hoefflinger,B.
Kragler,K.
Letzkus,F.
Ochsenhirt,J.
Reuter,C.
Springer,R.
4 more
Publication title:
Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3997
Pub. date:
2000
Page(from):
362
Page(to):
372
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436153 [0819436151]
Language:
English
Call no.:
P63600/3997
Type:
Conference Proceedings

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