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Investigation of proximity effect correction in electron projection lithography(EPI)

Author(s):
Okino,T. ( Nikon Corp. )
Suzuki,K.
Okamoto,K.
Kawata,S.
Uchikawa,K.
Suzuki,S.
Shimizu,S.
Fujiwara,T.
Yamada,A.
Kamijo,K.
5 more
Publication title:
Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3997
Pub. Year:
2000
Page(from):
235
Page(to):
244
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436153 [0819436151]
Language:
English
Call no.:
P63600/3997
Type:
Conference Proceedings

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