Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure
- Author(s):
Ocola,L.E. ( Lucent Technologies/Bell Labs. ) Blakey,M.I. Orphanos,P.A. Li,W.-Y. Novembre,A.E. Brainard,R.L. Mackevich,J.F. Taylor,G.N. - Publication title:
- Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3997
- Pub. Year:
- 2000
- Page(from):
- 194
- Page(to):
- 203
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436153 [0819436151]
- Language:
- English
- Call no.:
- P63600/3997
- Type:
- Conference Proceedings
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