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Delineation performances of advanced 100-kV EB writer on x-ray membrane mask

Author(s):
Nakayama,Y. ( Association of Super-Advanced Electronics Technologies )
Aoyama,H.
Tsuboi,S.
Watanabe,H.
Kikuchi,Y.
Ezaki,M.
Matsui,Y.
Morosawa,T.
Saito,K.
Ohki,S.
Matsuda,T.
6 more
Publication title:
Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3997
Pub. Year:
2000
Page(from):
105
Page(to):
112
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436153 [0819436151]
Language:
English
Call no.:
P63600/3997
Type:
Conference Proceedings

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