EUV mask fabrication with Cr absorber
- Author(s):
Mangnat,P.J. ( Motorola ) Hector,S.D. Rose,S. Cardinale,G.F. Tenjil,E. Stivers,A.R. - Publication title:
- Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3997
- Pub. Year:
- 2000
- Page(from):
- 76
- Page(to):
- 82
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436153 [0819436151]
- Language:
- English
- Call no.:
- P63600/3997
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
10
Conference Proceedings
Use of programmed multilayer defects in validating a defect compensation strategy for EUV Lithography
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Vendor capability for low-thermal-expansion mask substrates for EUV lithography
SPIE-The International Society for Optical Engineering |