Overview and status of the Next Generation Lithography Mask Center of Competency

Overview and status of the Next Generation Lithography Mask Center of Competency

Author(s):: Bouchard,L. ( IBM Microelectronics Div. )
Publication title:: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 3997
Pub. Year:: 2000
Page(from):: 10
Page(to):: 18
Pub. info.:: Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819436153 [0819436151]
Language:: English
Call no.:: P63600/3997
Type:: Conference Proceedings

Details

TDL ID:	ZA00018055
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2000 : 4th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2000.02.28-2000.03.01

Similar Items:

1 Conference Proceedings Next-generation lithography mask development at the NGL Mask Center of Competency Lercel,M.J., Brooks,C.J., Racette,K.C., Magg,C., Lawliss,M., Caldwell,N., Jeffer,R., Collins,K.W., Barrett,M., … SPIE - The International Society for Optical Engineering	7 Conference Proceedings Current status of next-generation EUVL mask blank tool development Ma, A., Kemp, K.G., Randive, R., Weaver, A., Roberti, M., Hayes, A.V., Abraham, D.L., Mirkarimi, P.B., Spiller, E.A., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Next-generation lithography mask development at the NGL-MCOC Lercel,M.J., Racette,K.C., Magg,C., Lawliss,M., Collins,K.W., Barrett,M., Trybendis,M.J., Bouchard,L. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Evaluation of a next-generation vector electron-beam mask pattern lithography system Rose,C., Wang,L.C., Justen,J.P., Ferreira,M. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Mask availability for next-generation lithography Lercel, M.J., Fisch, E., Racette, K.C., Lawliss, M., Williams, C. T., Kindt, L., Huang, C. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Fabrication of membrane mask for next-generation lithography Kim,D., Lera,J.D., Cho,H., Moon,J. SPIE - The International Society for Optical Engineering
4 Conference Proceedings Repeatable mask metrology for next-generation lithography tools Hentschel,S.L., Kamberian,H., Kovatch,J. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Image size control in next generation lithography masks Lercel,M.J., Magg,C. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Smart masks for next-generation lithography Huston, D.R., Sautera, W. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Advanced negative i-line resist development on metal surfaces for next-generation lithography mask fabrication Ghelli,C.L., Mancini,D.P., Resnick,D.J., Mangat,P.J.S., Dauksher,W.J. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Next-generation lithography mask inspection Bareket,N., Biellak,A., Pettibone,D.W., Stokowski,S.E. SPIE - The International Society for Optical Engineering	12 Conference Proceedings Development of a next-generation e-beam lithography system for 1-Gb DRAM masks Komagata,T., Nakagawa,Y., Takemura,H., Gotoh,N., Tanaka,K. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12