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Overview and status of the Next Generation Lithography Mask Center of Competency

Author(s):
Bouchard,L. ( IBM Microelectronics Div. )  
Publication title:
Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3997
Pub. date:
2000
Page(from):
10
Page(to):
18
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436153 [0819436151]
Language:
English
Call no.:
P63600/3997
Type:
Conference Proceedings

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