Blank Cover Image

EFFECTS OF LOW-TEMPERATURE SURFACE CLEANING USING ECR HYDROGEN PLASMA

Author(s):
Publication title:
Surface chemical cleaning and passivation for semiconductor processing
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
315
Pub. Year:
1993
Page(from):
279
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
Language:
English
Call no.:
M23500/315
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings AN ASSESSMENT OF ECR ARGON PLASMA ETCHING DAMAGE ON Si AND SiO2 INTERFACES

Nam, C. W., Ashok, S., Tsai, W., Day, M.E.

Materials Research Society
7 Conference Proceedings PLASMA HYDROGENATION STUDIES ON LOW-TEMPERATURE MBE-GROWN GaAs

Nakagawa, O. S., Ashok, S., Zhang, K., Miller, D. L., Chung, W. K.

Materials Research Society
2 Conference Proceedings ECR Hydrogen Plasma Treatment of Si: Defect Activation Under Thermal Anneal

Nam, C. W., Ashok, S.

MRS - Materials Research Society
8 Conference Proceedings Ammonia Plasma Passivation Effects on Properties of Post-CMP Low-k Hydrogen Silsesquioxane (HSQ)

Chang, T.-C., Liu, P.-T., Tsai, T.-M., Chang, C.-F., Yang, Y.-L., Sze, S.M., Shih, F.Y., Tsai, E., Chen, G., Lee, J.K.

Electrochemical Society
3 Conference Proceedings Surface Cleaning Effects of Silicon Substrates by ECR Hydrogen Plasma on Subsequent Homoepitaxial Growth

Kim, H. W.

Trans Tech Publications
9 Conference Proceedings LOW TEMPERATURE CLEANING OF Ge AND GaAs SURFACES USING HYDROGEN DISSOCIATED WITH A REMOTE NOBLE-GAS DISCHARGE

Hattangady, S.V., Rudder, R.A., Mantini, M.J., Fountain, G.G., Posthill, J.B., Markunas, R.J.

Materials Research Society
4 Conference Proceedings Effects of NH3/N2 Plasma Treatment on Very-Low-Temperature (100℃) Oxides

Kim, C.-H., Jung, S-H., Nam, W.-J., Han, M.-K.

Electrochemical Society
10 Conference Proceedings ECR OXYGEN PLASMA CLEANING OF OXIDE ETCHED SURFACES

Mikulan, P.I., Fonash, S.J., Reinhardt, K.A., Ta, T.

Electrochemical Society
5 Conference Proceedings Mechanism of Surface Roughness in Hydrogen Plasma Cleaned <100> Silicon at Low Temperatures

Hwang, K-H., Yoon, E., Whang, K-W., Lee, J.Y.

Electrochemical Society
11 Conference Proceedings Low-Temperature ECR-Plasma Assisted MOCVD Microcrystalline and Amorphous GaN Deposition and Characterization for Electronic Devices

Hassan, Z., Kordesch, M. E., Jadwisienzak, W. M., Lozykowski, H. J., Halverson, W., Colter, P. C.

MRS - Materials Research Society
6 Conference Proceedings Use of a Langmuir Probe for ECR Plasma Characterization

Daltrini, A. M., Moshkalyov, S. A., Ramos, A. C. S., Swart, J. W.

Electrochemical Society
12 Conference Proceedings Low temperature Doping of Silicon by Hydrogen Plasma Treatments*

Job, R., Ulyashin, A.G., Ma, Y., Fahnwr, W.R., Simoen, E., Rafi, J.M., Claeys, C., Niedernostheide, F.J., Schulze, H.J.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12