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AN EFFECTIVE IN-SITU O2 HIGH DENSITY PLASMA CLEAN

Author(s):
Reinhardt, K.
Divincenzo, B.
Yang, C.-L.
Arleo, P.
Marks, J.
Mikulan, P.
Gu, T.
Fonash, S.
3 more
Publication title:
Surface chemical cleaning and passivation for semiconductor processing
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
315
Pub. Year:
1993
Page(from):
267
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
Language:
English
Call no.:
M23500/315
Type:
Conference Proceedings

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