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A STUDY OF SURFACE AND SUBSURFACE PROPERTIES OF Si(100) AFTER HYDROGEN ION-BEAM EXPOSURE

Author(s):
Liu, H. X.
Schneider, T. P.
Montgomery, J.
Chen, Y. L.
Buczkowski, A.
Shimura, F.
Nemanich, R. J.
Maher, D. M.
Korzec, D.
Engemann, J.
5 more
Publication title:
Surface chemical cleaning and passivation for semiconductor processing
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
315
Pub. Year:
1993
Page(from):
231
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
Language:
English
Call no.:
M23500/315
Type:
Conference Proceedings

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