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HYDROGEN PLASMA CLEANING OF THE Si(100) SURFACE: REMOVAL OF OXYGEN AND CARBON AND THE ETCHING OF Si

Author(s):
Kinosky, David
Qian, R.
Mahajan, A.
Thomas, S.
Munguia, P.
Fretwell, J.
Banerjee, S.
Tasch, A.
3 more
Publication title:
Surface chemical cleaning and passivation for semiconductor processing
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
315
Pub. Year:
1993
Page(from):
219
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
Language:
English
Call no.:
M23500/315
Type:
Conference Proceedings

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