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High Rate Dry Etching of GaN, AIN and InN in ECR Cl2/CH4/H2/Ar Plasmas

Author(s):
Vartuli, C. B.
Pearton, S. J.
Abernathy, C. R.
Shul, R. J.
Kilcoyne, S. P.
Crawford, M. Hagerott
Howard, A. J.
Parmeter, J. E.
3 more
Publication title:
Materials - fabrication and patterning at the nanoscale : Symposium held April 19-20, 1995, San Francisco, California, USA
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
380
Pub. date:
1995
Page(from):
37
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992832 [1558992839]
Language:
English
Call no.:
M23500/380
Type:
Conference Proceedings

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