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Low Temperature Selective Si Epitaxy Using Si2H6 and Cl2: Investigations into Selectivity Robustness and Epitaxial Film Quality

Author(s):
Publication title:
Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
429
Pub. Year:
1996
Page(from):
355
Pub. info.:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993327 [1558993320]
Language:
English
Call no.:
M23500/429
Type:
Conference Proceedings

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