SEMICONDUCTOR NANOCRYSTALS FORMED IN SiO2 BY ION IMPLANTATION

SEMICONDUCTOR NANOCRYSTALS FORMED IN SiO2 BY ION IMPLANTATION

Author(s):

Publication title:

Microcrystalline and nanocrystalline semiconductors : Symposium held November 29-December 2, 1994, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

358

Pub. Year:

1995

Page(from):

175

Pub. info.:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992597 [1558992596]

Language:

English

Call no.:

M23500/358

Type:

Conference Proceedings

Details

TDL ID:	ZA00017983
Series ID:	PA00000011
Conf. info. (Name):	Symposium on microcrystalline and nanocrystalline semiconductors
Conf. info. (Number):	1994
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1994.11.29-1994.12.02

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