THE EFFECTS OF DEPOSITION PARAMETERS ON THE PROPERTIES OF SiO2 FILMS DEPOSITED BY MICROWAVE ECR PLASMAS

THE EFFECTS OF DEPOSITION PARAMETERS ON THE PROPERTIES OF SiO2 FILMS DEPOSITED BY MICROWAVE ECR PLASMAS

Author(s):

Publication title:

Gas-phase and surface chemistry in electronic materials processing : symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

334

Pub. Year:

1994

Page(from):

373

Pub. info.:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992337 [1558992332]

Language:

English

Call no.:

M23500/334

Type:

Conference Proceedings

Details

TDL ID:	ZA00017981
Series ID:	PA00000011
Conf. info. (Name):	Symposium on gas-phase and surface chemistry in electronic materials processing
Conf. info. (Number):	1993
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1993.11.29-1993.12.02

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