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Initial plasma oxidation of silicon studied by real-time ellipsometry

Author(s):
Publication title:
International Symposium on Polarization Analysis and Applications to Device Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2873
Pub. Year:
1996
Page(from):
246
Page(to):
249
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422712 [0819422711]
Language:
English
Call no.:
P63600/2873
Type:
Conference Proceedings

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