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Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography

Author(s):
Publication title:
Current developments in optical design and optical engineering VI : 5-7 August 1996, Denver, Colorado
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2863
Pub. Year:
1996
Page(from):
95
Page(to):
101
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819422514 [0819422517]
Language:
English
Call no.:
P63600/2863
Type:
Conference Proceedings

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