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Pattern-data preparation method to enchance high-throughput mask fabrication in variable-shaped e-beam writing system

Author(s):
Hara,S. ( Toshiba Corp. )
Murakami,E.
Magoshi,S.
Koyama,K.
Anze,H.
Ogawa,Y.
Kabeya,A.
Ooki,S.
Saito,T.
Fujii,T.
Sakamoto,S.
Suzuki,H.
Yano,M.
Watanabe,S.
9 more
Publication title:
Photomask and X-Ray Mask Technology III
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
2793
Pub. Year:
1996
Page(from):
410
Page(to):
417
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421791 [0819421790]
Language:
English
Call no.:
P63600/2793
Type:
Conference Proceedings

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