Detectability and printability of programmed defect reticle for 256-Mb dram
- Author(s):
- Park,J.H. ( Samsung Electronics Co.,Ltd. )
- Cho,H.-K.
- Kim,Y.-H.
- Lee,K.-H.
- Yoon,H.-S.
- Publication title:
- Photomask and X-Ray Mask Technology III
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2793
- Pub. Year:
- 1996
- Page(from):
- 300
- Page(to):
- 311
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- Language:
- English
- Call no.:
- P63600/2793
- Type:
- Conference Proceedings
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