Subquarter-micron lithography with dual-trench-type alternating PSM
- Author(s):
Kanai,H. ( Toshiba Corp. ) Kawano,K. Tanaka,S. Shiobara,E. Aoki,M. Yoneda,I. Ito,S. - Publication title:
- Photomask and X-Ray Mask Technology III
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2793
- Pub. Year:
- 1996
- Page(from):
- 165
- Page(to):
- 173
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421791 [0819421790]
- Language:
- English
- Call no.:
- P63600/2793
- Type:
- Conference Proceedings
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